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Chlorine precursors for gate oxidation processes

dc.contributor.authorMc Geary, M. J.
dc.contributor.authorMertens, Paul
dc.contributor.authorVermeire, Bert
dc.contributor.authorHeyns, Marc
dc.contributor.authorSprey, Hessel
dc.contributor.authorLubbers, A.
dc.contributor.authorSchaekers, Marc
dc.date.accessioned2021-09-30T09:17:56Z
dc.date.available2021-09-30T09:17:56Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2017
dc.sourceIIOimport
dc.titleChlorine precursors for gate oxidation processes
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorSchaekers, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage115
dc.source.endpage125
dc.source.conferenceEnvironmental, Safety, and Health Issues in IC Production
dc.source.conferencedate4/12/1996
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 447


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