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EUV flare and proximity modeling and model-based correction

dc.contributor.authorZuniga, Christian D.
dc.contributor.authorHabib, Mohamed
dc.contributor.authorWord, James C.
dc.contributor.authorLorusso, Gian
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBaylav, Burak
dc.contributor.authorChalasani, Raghu
dc.contributor.authorLam, Michael
dc.date.accessioned2021-10-19T22:37:09Z
dc.date.available2021-10-19T22:37:09Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20241
dc.sourceIIOimport
dc.titleEUV flare and proximity modeling and model-based correction
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79690S
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan José (CA) USA
imec.availabilityPublished - imec
imec.internalnotesProceedings SPIE, Vol. 7969


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