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Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications

dc.contributor.authorMills, C. R.
dc.contributor.authorGrover, G. S.
dc.contributor.authorMueller, B. L.
dc.contributor.authorSteckenrider, J. S.
dc.contributor.authorGaneshkumar, S.
dc.contributor.authorLeach, G. W.
dc.contributor.authorHuang, C. K.
dc.contributor.authorGrillaert, Joost
dc.date.accessioned2021-09-30T09:18:26Z
dc.date.available2021-09-30T09:18:26Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2025
dc.sourceIIOimport
dc.titleRaising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage179
dc.source.endpage185
dc.source.conferenceProceedings 2nd International Chemical-Mechanical Polish (C.M.P.) for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencedate13/02/1997
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access


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