dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Vaglio Pret, Alessandro | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-20T10:01:33Z | |
dc.date.available | 2021-10-20T10:01:33Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20283 | |
dc.source | IIOimport | |
dc.title | Dry etching challenges for patterning smooth lines : LWR reduction of extreme ultra violet photo resist | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 83280L | |
dc.source.conference | Advanced Etch Technology for Nanopatterning | |
dc.source.conferencedate | 12/02/2012 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 8328 | |