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Al-induced defect generation in cubic phase HfO2/SiO2/Si gate stacks

dc.contributor.authorArimura, Hiroaki
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorVeloso, Anabela
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDegraeve, Robin
dc.contributor.authorSchram, Tom
dc.contributor.authorChew, Soon Aik
dc.contributor.authorFranco, Jacopo
dc.contributor.authorCho, Moon Ju
dc.contributor.authorKaczer, Ben
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-20T10:02:10Z
dc.date.available2021-10-20T10:02:10Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20298
dc.sourceIIOimport
dc.titleAl-induced defect generation in cubic phase HfO2/SiO2/Si gate stacks
dc.typeMeeting abstract
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.conference43rd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate6/12/2012
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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