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Optimizing high frequency ultrasound cleaning in the semiconductor industry

dc.contributor.authorBrems, Steven
dc.contributor.authorHauptmann, Marc
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-20T10:08:44Z
dc.date.available2021-10-20T10:08:44Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20390
dc.sourceIIOimport
dc.titleOptimizing high frequency ultrasound cleaning in the semiconductor industry
dc.typeProceedings paper
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorCamerotto, Elisabeth
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage236
dc.source.conference8th International Symposium on Cavitation - CAV
dc.source.conferencedate14/08/2012
dc.source.conferencelocationSingapore
imec.availabilityPublished - imec


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