Challenges and solutions ensuring EUVL photomask integrity

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Authors
Brux, O.; Dress, P.; Schmalfuss, H.; Jonckheere, Rik; Koolen-Hermkens, W.
Conference
Photomask and Next-Generation Lithography Mask Technology XIX
Title
Challenges and solutions ensuring EUVL photomask integrity
Publication type
Proceedings paper
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