Show simple item record

Challenges and solutions ensuring EUVL photomask integrity

dc.contributor.authorBrux, O.
dc.contributor.authorDress, P.
dc.contributor.authorSchmalfuss, H.
dc.contributor.authorJonckheere, Rik
dc.contributor.authorKoolen-Hermkens, W.
dc.date.accessioned2021-10-20T10:09:48Z
dc.date.available2021-10-20T10:09:48Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20401
dc.sourceIIOimport
dc.titleChallenges and solutions ensuring EUVL photomask integrity
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage84411J
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XIX
dc.source.conferencedate17/04/2012
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8441


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record