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Reliability in gate first and gate last Ultra-Thin-EOT gate stacks assessed with CV-eMSM BTI characterization

dc.contributor.authorBury, Erik
dc.contributor.authorKaczer, Ben
dc.contributor.authorToledano Luque, Maria
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorVeloso, Anabela
dc.contributor.authorChew, Soon Aik
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorSchram, Tom
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-20T10:10:30Z
dc.date.available2021-10-20T10:10:30Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20407
dc.sourceIIOimport
dc.titleReliability in gate first and gate last Ultra-Thin-EOT gate stacks assessed with CV-eMSM BTI characterization
dc.typeMeeting abstract
dc.contributor.imecauthorBury, Erik
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecBury, Erik::0000-0002-5847-3949
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.source.peerreviewyes
dc.source.conference43rd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate5/12/2012
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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