De-process and physical characterization of HfO2 based resistive memory as studied by C-AFM

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Authors
Celano, Umberto; Chen, Yangyin; Wouters, Dirk; Jurczak, Gosia; Vandervorst, Wilfried
Conference
ECS Fall Meeting Symposium E11: Nonvolatile Memories
Title
De-process and physical characterization of HfO2 based resistive memory as studied by C-AFM
Publication type
Meeting abstract
Embargo date
9999-12-31
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