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High selective plasma etching for PMMA of block-copolymer in directed-self assembly

dc.contributor.authorChan, BT
dc.contributor.authorTahara, Shigeru
dc.contributor.editorde Marneffe, Jean-Francois
dc.contributor.editorGronheid, Roel
dc.contributor.editorXu, Kaidong
dc.contributor.editorNishimura, Eiichi
dc.contributor.editorBoullart, Werner
dc.date.accessioned2021-10-20T10:13:46Z
dc.date.available2021-10-20T10:13:46Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20434
dc.sourceIIOimport
dc.titleHigh selective plasma etching for PMMA of block-copolymer in directed-self assembly
dc.typeMeeting abstract
dc.contributor.imecauthorChan, BT
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.conference34th International Symposium on Dry Process - DPS
dc.source.conferencedate15/11/2012
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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