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Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration

dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorDusa, Mircea
dc.contributor.authorChiou, T.-B.
dc.contributor.authorFumar-Pici, A.
dc.date.accessioned2021-10-20T10:14:00Z
dc.date.available2021-10-20T10:14:00Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20436
dc.sourceIIOimport
dc.titleLine-end gap measurement with YieldStar scatterometer: towards an OPC model calibration
dc.typeProceedings paper
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDusa, Mircea
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83242I
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVI
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8324


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