Publication:

Hydrogen-induced resistive switching in TiN/ALD HfO2/PEALD TiN RRAM device

Date

2012

Journal article

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Files

25008.pdf 369.29 KB

Author(s)

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Toeller, Michael

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Adelmann, Christoph

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Groeseneken, Guido

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Journal

IEEE Electron Device Letters

Metrics

1940 since deposited on 2021-10-20

Acq. date: 2026-01-09