dc.contributor.author | Civale, Yann | |
dc.contributor.author | Redolfi, Augusto | |
dc.contributor.author | Velenis, Dimitrios | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Beynet, Julien | |
dc.contributor.author | Jung, Insoo | |
dc.contributor.author | Woo, Jeong-Jun | |
dc.contributor.author | Swinnen, Bart | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Beyne, Eric | |
dc.date.accessioned | 2021-10-20T10:18:59Z | |
dc.date.available | 2021-10-20T10:18:59Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20469 | |
dc.source | IIOimport | |
dc.title | Highly-conformal plasma-enhanced atomic-layer deposition silicon dioxide liner for high aspect-ratio through-silicon via 3D interconnections | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Redolfi, Augusto | |
dc.contributor.imecauthor | Velenis, Dimitrios | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Swinnen, Bart | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Beyne, Eric | |
dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.conference | 4th Electronics System Integration Technologies Conference - ESTC | |
dc.source.conferencedate | 17/10/2012 | |
dc.source.conferencelocation | Amsterdam The Netherlands | |
imec.availability | Published - open access | |