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Advanced CMOS manufacturing, a drive for plasma science and technology

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorMilenin, Alexey
dc.contributor.authorSamara, Vladimir
dc.contributor.authorBoullart, Werner
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T10:32:13Z
dc.date.available2021-10-20T10:32:13Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20548
dc.sourceIIOimport
dc.titleAdvanced CMOS manufacturing, a drive for plasma science and technology
dc.typeProceedings paper
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conference10th Technological Plasma Workshop - TPW
dc.source.conferencedate17/12/2012
dc.source.conferencelocationMilton Keynes UK
imec.availabilityPublished - imec


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