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Study of damage caused by non-reactive Ar plasma on an organic low-k material

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLjazouli, Rami
dc.contributor.authorSouriau, Laurent
dc.contributor.authorZhang, Liping
dc.contributor.authorWilson, Chris
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T10:32:37Z
dc.date.available2021-10-20T10:32:37Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20550
dc.sourceIIOimport
dc.titleStudy of damage caused by non-reactive Ar plasma on an organic low-k material
dc.typeMeeting abstract
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorWilson, Chris
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
dc.identifier.urlhttp://pesm2012.insight-outside.fr
imec.availabilityPublished - imec
imec.internalnoteshttp://pesm2012.insight-outside.fr


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