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Roughness mitigation at sub-30nm semiconductor patterns: the effect of H2/Ar plasma

dc.contributor.authorDe Schepper, Peter
dc.date.accessioned2021-10-20T10:33:53Z
dc.date.available2021-10-20T10:33:53Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20557
dc.sourceIIOimport
dc.titleRoughness mitigation at sub-30nm semiconductor patterns: the effect of H2/Ar plasma
dc.typeOral presentation
dc.contributor.imecauthorDe Schepper, Peter
dc.source.peerreviewno
dc.source.conference15th Workshop on the Exploration of Low-Temperature Plasma Physics - WELTPP-15
dc.source.conferencedate22/11/2012
dc.source.conferencelocationKerkrade The Netherlands
imec.availabilityPublished - imec


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