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The impact and importance of line width roughness on sub-20nm nanostructures

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-20T10:34:04Z
dc.date.available2021-10-20T10:34:04Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20558
dc.sourceIIOimport
dc.titleThe impact and importance of line width roughness on sub-20nm nanostructures
dc.typeMeeting abstract
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceWE-Heraeus-Seminar Physics School
dc.source.conferencedate11/06/2012
dc.source.conferencelocationBad Honnef Germany
imec.availabilityPublished - imec


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