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Impact of Fin height variations on SRAM yield

dc.contributor.authorDobrovolny, Petr
dc.contributor.authorZuber, Paul
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorGarcia Bardon, Marie
dc.contributor.authorChiarella, Thomas
dc.contributor.authorBuchegger, Peter
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorVerkest, Diederik
dc.contributor.authorSteegen, An
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-20T10:46:07Z
dc.date.available2021-10-20T10:46:07Z
dc.date.issued2012-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20617
dc.sourceIIOimport
dc.titleImpact of Fin height variations on SRAM yield
dc.typeProceedings paper
dc.contributor.imecauthorDobrovolny, Petr
dc.contributor.imecauthorZuber, Paul
dc.contributor.imecauthorGarcia Bardon, Marie
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecDobrovolny, Petr::0000-0002-1465-481X
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage2
dc.source.conferenceInternational Symposium on VLSI Technology, Systems and Applications - VLSI-TSA
dc.source.conferencedate23/04/2012
dc.source.conferencelocationHsinchu City Taiwan
imec.availabilityPublished - open access


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