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Stress techniques in advanced transistor architectures: bulk FinFETs and implant-free quantum well transistors

dc.contributor.authorEneman, Geert
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorCollaert, Nadine
dc.contributor.authorMitard, Jerome
dc.contributor.authorHellings, Geert
dc.contributor.authorYamaguchi, Shinpei
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVincent, Benjamin
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorVeloso, Anabela
dc.contributor.authorChiarella, Thomas
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorLoo, Roger
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-20T10:54:44Z
dc.date.available2021-10-20T10:54:44Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20654
dc.sourceIIOimport
dc.titleStress techniques in advanced transistor architectures: bulk FinFETs and implant-free quantum well transistors
dc.typeProceedings paper
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage235
dc.source.endpage246
dc.source.conferenceDielectrics for Nanosystems 5: Materials Science, Processing, Reliability, and Manufacturing -and- Tutorials in Nanotechnology
dc.source.conferencedate6/05/2012
dc.source.conferencelocationSeattle, WA USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 45, Iss. 3


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