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Thin SiGe films in narrow structures: comparison of different analysis techniques for the thickness and composition measurements

dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorGilbert, Matthieu
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-20T11:04:38Z
dc.date.available2021-10-20T11:04:38Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20693
dc.sourceIIOimport
dc.titleThin SiGe films in narrow structures: comparison of different analysis techniques for the thickness and composition measurements
dc.typeMeeting abstract
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageP60
dc.source.conferenceSIMS Europe: 8th European Workshop on Secondary Ion Mass Spectrometry
dc.source.conferencedate9/09/2012
dc.source.conferencelocationMünster Germany
imec.availabilityPublished - imec


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