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Study of porogen removal by HWCVD for the fabrication of advanced low-k films

dc.contributor.authorGodavarthi, Srinivas
dc.contributor.authorWang, Cong
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorMatsumoto, Yasuhiro
dc.contributor.authorKoudriavtsev, I
dc.contributor.authorTielens, Hilde
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T11:12:52Z
dc.date.available2021-10-20T11:12:52Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20725
dc.sourceIIOimport
dc.titleStudy of porogen removal by HWCVD for the fabrication of advanced low-k films
dc.typeMeeting abstract
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorTielens, Hilde
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpageT5-7
dc.source.endpageT5-7
dc.source.conference7th International Conference on Hot- Wire Chemical Vapor deposition - Cat-CVD
dc.source.conferencedate8/10/2012
dc.source.conferencelocationOsaka Japan
imec.availabilityPublished - imec


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