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Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorHoefnagels, Rik
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorFoubert, Philippe
dc.date.accessioned2021-10-20T11:14:24Z
dc.date.available2021-10-20T11:14:24Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20731
dc.sourceIIOimport
dc.titleAssessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
dc.typeOral presentation
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorHoefnagels, Rik
dc.contributor.imecauthorFoubert, Philippe
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec


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