Show simple item record

Impact of through silicon via induced mechanical stress on fully depleted bulk FinFET technology

dc.contributor.authorGuo, Wei
dc.contributor.authorVan der Plas, Geert
dc.contributor.authorIvankovic, Andrej
dc.contributor.authorCherman, Vladimir
dc.contributor.authorEneman, Geert
dc.contributor.authorDe Wachter, Bart
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorKubicek, Stefan
dc.contributor.authorCivale, Yann
dc.contributor.authorChiarella, Thomas
dc.contributor.authorVandevelde, Bart
dc.contributor.authorCroes, Kristof
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorThean, Aaron
dc.contributor.authorBeyer, Gerald
dc.contributor.authorSwinnen, Bart
dc.contributor.authorBeyne, Eric
dc.date.accessioned2021-10-20T11:23:20Z
dc.date.available2021-10-20T11:23:20Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20763
dc.sourceIIOimport
dc.titleImpact of through silicon via induced mechanical stress on fully depleted bulk FinFET technology
dc.typeProceedings paper
dc.contributor.imecauthorGuo, Wei
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.imecauthorCherman, Vladimir
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDe Wachter, Bart
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorVandevelde, Bart
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorSwinnen, Bart
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecVandevelde, Bart::0000-0002-6753-6438
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage18.4
dc.source.conferenceInternational Electron Devices Meeting - IEDM
dc.source.conferencedate10/12/2012
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
25220.pdf
Size:
3.011Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record