dc.contributor.author | Hellings, Geert | |
dc.contributor.author | Linten, Dimitri | |
dc.contributor.author | Thijs, Steven | |
dc.contributor.author | Chen, Shih-Hung | |
dc.contributor.author | Witters, Liesbeth | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Zografos, Odysseas | |
dc.contributor.author | Groeseneken, Guido | |
dc.date.accessioned | 2021-10-20T11:33:20Z | |
dc.date.available | 2021-10-20T11:33:20Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20798 | |
dc.source | IIOimport | |
dc.title | ESD characterization of high mobility SiGe quantum well and Ge devices for future CMOS scaling | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hellings, Geert | |
dc.contributor.imecauthor | Linten, Dimitri | |
dc.contributor.imecauthor | Thijs, Steven | |
dc.contributor.imecauthor | Chen, Shih-Hung | |
dc.contributor.imecauthor | Witters, Liesbeth | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Zografos, Odysseas | |
dc.contributor.imecauthor | Groeseneken, Guido | |
dc.contributor.orcidimec | Hellings, Geert::0000-0002-5376-2119 | |
dc.contributor.orcidimec | Linten, Dimitri::0000-0001-8434-1838 | |
dc.contributor.orcidimec | Thijs, Steven::0000-0003-2889-8345 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | Zografos, Odysseas::0000-0002-9998-8009 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 37 | |
dc.source.endpage | 42 | |
dc.source.conference | Reliability Center Of Japan Symposium | |
dc.source.conferencedate | 30/10/2012 | |
dc.source.conferencelocation | Tokyo Japan | |
imec.availability | Published - imec | |