Cryogenic approaches to low-damage patterning of porous low-k films
dc.contributor.author | Iacopi, Francesca | |
dc.contributor.author | Stauss, Sven | |
dc.contributor.author | Terashima, Kazuo | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-20T11:46:02Z | |
dc.date.available | 2021-10-20T11:46:02Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20841 | |
dc.source | IIOimport | |
dc.title | Cryogenic approaches to low-damage patterning of porous low-k films | |
dc.type | Meeting abstract | |
dc.source.peerreview | yes | |
dc.source.conference | Plasma Etch and Strip in Mcroelectronics - PESM | |
dc.source.conferencedate | 15/03/2012 | |
dc.source.conferencelocation | Grenoble France | |
imec.availability | Published - imec |
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