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Cryogenic approaches to low-damage patterning of porous low-k films

dc.contributor.authorIacopi, Francesca
dc.contributor.authorStauss, Sven
dc.contributor.authorTerashima, Kazuo
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T11:46:02Z
dc.date.available2021-10-20T11:46:02Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20841
dc.sourceIIOimport
dc.titleCryogenic approaches to low-damage patterning of porous low-k films
dc.typeMeeting abstract
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Mcroelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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