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High efficiency low temperature pre-epi clean method for advanced group IV epi processing

dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorWeeks, Doran
dc.contributor.authorBauer, Matthias
dc.contributor.authorMaes, Jan
dc.contributor.authorTolle, John
dc.contributor.authorThomas, Shawn
dc.contributor.authorAlian, AliReza
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLoo, Roger
dc.date.accessioned2021-10-20T13:02:48Z
dc.date.available2021-10-20T13:02:48Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21071
dc.sourceIIOimport
dc.titleHigh efficiency low temperature pre-epi clean method for advanced group IV epi processing
dc.typeProceedings paper
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage339
dc.source.endpage348
dc.source.conferenceSiGe, Ge, and Related Compunds 5: Materials, Processing, and Devices
dc.source.conferencedate7/10/2012
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 50, Issue 9


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