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Automated OPC for application in advanced lithography

dc.contributor.authorRonse, Kurt
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorRandall, John
dc.contributor.authorJonckheere, Rik
dc.contributor.authorGhandehari, Kouros
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-30T09:27:23Z
dc.date.available2021-09-30T09:27:23Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2108
dc.sourceIIOimport
dc.titleAutomated OPC for application in advanced lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage138
dc.source.endpage144
dc.source.conferencePhotomask and X-Ray Mask Technology IV
dc.source.conferencedate17/04/1997
dc.source.conferencelocationKawasaki Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 3096


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