dc.contributor.author | Nagar, Magi | |
dc.contributor.author | Radisic, Alex | |
dc.contributor.author | Strubbe, Katrien | |
dc.contributor.author | Vereecken, Philippe | |
dc.date.accessioned | 2021-10-20T13:47:07Z | |
dc.date.available | 2021-10-20T13:47:07Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21185 | |
dc.source | IIOimport | |
dc.title | Exploration of process window for fill of sub 30 nm features by direct plating | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Radisic, Alex | |
dc.contributor.imecauthor | Vereecken, Philippe | |
dc.contributor.orcidimec | Vereecken, Philippe::0000-0003-4115-0075 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2733 | |
dc.source.conference | 222nd Meeting of the The Electrochemical Society: Symposium E8: Processing Materials of 3D Interconnects | |
dc.source.conferencedate | 7/10/2012 | |
dc.source.conferencelocation | Honolulu, HI USA | |
imec.availability | Published - imec | |
imec.internalnotes | ECS Meeting Abstracts; Vol. MA2012-02 | |