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An Advanced Calibration Method for Modelling Oxidation and Mechanical Stress in Sub-Micron CMOS Isolation Structures

dc.contributor.authorJones, S. K.
dc.contributor.authorPoncet, A.
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorAhmed, M.
dc.contributor.authorRothwell, W. J.
dc.date.accessioned2021-09-29T12:42:34Z
dc.date.available2021-09-29T12:42:34Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/211
dc.sourceIIOimport
dc.titleAn Advanced Calibration Method for Modelling Oxidation and Mechanical Stress in Sub-Micron CMOS Isolation Structures
dc.typeProceedings paper
dc.contributor.imecauthorDe Wolf, Ingrid
dc.source.peerreviewno
dc.source.beginpage877
dc.source.endpage880
dc.source.conferenceInternational Electron Devices Meeting (IEDM). Technical Digest
dc.source.conferencedate11/12/1994
dc.source.conferencelocationSan Francisco, Ca USA
imec.availabilityPublished - imec


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