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Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists
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Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists
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Date
2012
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24727.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Perera, Rupert c.
;
Pollentier, Ivan
;
Underwood, James H.
;
Houser, David C.
Journal
Abstract
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1850
since deposited on 2021-10-20
Acq. date: 2026-01-10
Citations
Metrics
Views
1850
since deposited on 2021-10-20
Acq. date: 2026-01-10
Citations