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Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists

dc.contributor.authorPerera, Rupert c.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorUnderwood, James H.
dc.contributor.authorHouser, David C.
dc.date.accessioned2021-10-20T14:26:20Z
dc.date.available2021-10-20T14:26:20Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21282
dc.sourceIIOimport
dc.titleDirect comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists
dc.typeOral presentation
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access


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