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Vanadium oxide thin films grown by ALD using TEMAV and O3 or H2O precursors

dc.contributor.authorPeter, Antony
dc.contributor.authorToeller, Michael
dc.contributor.authorRadu, Iuliana
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSchaekers, Marc
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T14:27:45Z
dc.date.available2021-10-20T14:27:45Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21285
dc.sourceIIOimport
dc.titleVanadium oxide thin films grown by ALD using TEMAV and O3 or H2O precursors
dc.typeMeeting abstract
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageTF-ThP1
dc.source.conferenceAVS 59th Annual International Symposium and Exhibition
dc.source.conferencedate28/10/2012
dc.source.conferencelocationTampa, FL USA
imec.availabilityPublished - open access


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