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Spacer-defined EUV lithography reducing variability of 12nm NAND Flash memories
Publication:
Spacer-defined EUV lithography reducing variability of 12nm NAND Flash memories
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Date
2012
Proceedings Paper
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24520.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Poliakov, Pavel
;
Blomme, Pieter
;
Vaglio Pret, Alessandro
;
Miranda Corbalan, Miguel
;
Gronheid, Roel
;
Wiaux, Vincent
;
Versluijs, Janko
;
Verkest, Diederik
;
Van Houdt, Jan
;
Dehaene, Wim
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Views
1856
since deposited on 2021-10-20
2
last month
2
last week
Acq. date: 2026-01-07
Citations