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Spacer-defined EUV lithography reducing variability of 12nm NAND Flash memories

dc.contributor.authorPoliakov, Pavel
dc.contributor.authorBlomme, Pieter
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorGronheid, Roel
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVersluijs, Janko
dc.contributor.authorVerkest, Diederik
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDehaene, Wim
dc.date.accessioned2021-10-20T14:42:33Z
dc.date.available2021-10-20T14:42:33Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21319
dc.sourceIIOimport
dc.titleSpacer-defined EUV lithography reducing variability of 12nm NAND Flash memories
dc.typeProceedings paper
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDehaene, Wim
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage33
dc.source.endpage36
dc.source.conference4th IEEE International Memory Workshop - IMW
dc.source.conferencedate20/06/2012
dc.source.conferencelocationMilano Italy
imec.availabilityPublished - open access


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