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Implementing cubic-phase HfO2 with $j-value ~ 30 in low-VT replacementgate pMOS devices for improved EOT-Scaling and reliability
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Authors
Ragnarsson, Lars-Ake
;
Adelmann, Christoph
;
Higuchi, Yuichi
;
Opsomer, Karl
;
Veloso, Anabela
;
Chew, Soon Aik
;
Rohr, Erica
;
Vecchio, Emma
;
Shi, Xiaoping
;
Devriendt, Katia
;
Sebaai, Farid
;
Kauerauf, Thomas
;
Pawlak, Malgorzata
;
Schram, Tom
;
Van Elshocht, Sven
;
Horiguchi, Naoto
;
Thean, Aaron
Conference
Symposium on VLSI Technology - VLSIT
Title
Implementing cubic-phase HfO2 with $j-value ~ 30 in low-VT replacementgate pMOS devices for improved EOT-Scaling and reliability
Publication type
Proceedings paper
Embargo date
9999-12-31
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