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Implementing cubic-phase HfO2 with $j-value ~ 30 in low-VT replacementgate pMOS devices for improved EOT-Scaling and reliability

dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorHiguchi, Yuichi
dc.contributor.authorOpsomer, Karl
dc.contributor.authorVeloso, Anabela
dc.contributor.authorChew, Soon Aik
dc.contributor.authorRohr, Erica
dc.contributor.authorVecchio, Emma
dc.contributor.authorShi, Xiaoping
dc.contributor.authorDevriendt, Katia
dc.contributor.authorSebaai, Farid
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorSchram, Tom
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-20T15:03:58Z
dc.date.available2021-10-20T15:03:58Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21371
dc.sourceIIOimport
dc.titleImplementing cubic-phase HfO2 with $j-value ~ 30 in low-VT replacementgate pMOS devices for improved EOT-Scaling and reliability
dc.typeProceedings paper
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceSymposium on VLSI Technology - VLSIT
dc.source.conferencedate12/06/2012
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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