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Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors

dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorMilenin, Alexey
dc.contributor.authorDelvaux, Christie
dc.contributor.authorOng, Patrick
dc.contributor.authorPathak, Shibnath
dc.contributor.authorVermeulen, Diedrik
dc.contributor.authorSterckx, Gunther
dc.contributor.authorWinroth, Gustaf
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLepage, Guy
dc.contributor.authorBogaerts, Wim
dc.contributor.authorBaets, Roel
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorAbsil, Philippe
dc.date.accessioned2021-10-20T15:57:37Z
dc.date.available2021-10-20T15:57:37Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21487
dc.sourceIIOimport
dc.titleAdvanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
dc.typeProceedings paper
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorSterckx, Gunther
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLepage, Guy
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorBaets, Roel
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage15
dc.source.endpage16
dc.source.conference17th Opto-Electronics and Communications Conference - OECC
dc.source.conferencedate2/07/2012
dc.source.conferencelocationBexco, Busan Korea
imec.availabilityPublished - open access


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