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15nm HP patterning with EUV lithography and SADP

dc.contributor.authorSouriau, Laurent
dc.contributor.authorHellin, David
dc.contributor.authorKunnen, Eddy
dc.contributor.authorVersluijs, Janko
dc.contributor.authorDekkers, Harold
dc.contributor.authorAlbert, Johan
dc.contributor.authorOrain, Isabelle
dc.contributor.authorYoshie, Kimura
dc.contributor.authorXu, Kaidong
dc.contributor.authorVertommen, Johan
dc.contributor.authorWiaux, Vincent
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-20T16:19:41Z
dc.date.available2021-10-20T16:19:41Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21534
dc.sourceIIOimport
dc.title15nm HP patterning with EUV lithography and SADP
dc.typeMeeting abstract
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conference34th International Symposium on Dry Process - DPS
dc.source.conferencedate15/11/2012
dc.source.conferencelocationTokyo Japan
dc.identifier.urlhttp://www.dry-process.org/2012/index.html
imec.availabilityPublished - imec


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