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Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications

dc.contributor.authorSwerts, Johan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorArmini, Silvia
dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T16:37:59Z
dc.date.available2021-10-20T16:37:59Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21573
dc.sourceIIOimport
dc.titleInterplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications
dc.typeMeeting abstract
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2946
dc.source.conferenceECS Fall Meeting Symposium E13: Plasma Processing 19
dc.source.conferencedate8/10/2012
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesECS Meeting Abstracts; Vol. 2012-02


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