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Conference contributions
ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces
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ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces
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Date
1997
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Storm, Wolfgang
;
Vandervorst, Wilfried
;
Vanhaelemeersch, Serge
;
Baklanov, Mikhaïl
;
Maex, Karen
;
Poleunis, C.
;
Bertrand, P.
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1976
since deposited on 2021-09-30
4
last month
1
last week
Acq. date: 2026-01-10
Citations
Metrics
Views
1976
since deposited on 2021-09-30
4
last month
1
last week
Acq. date: 2026-01-10
Citations