Publication:
Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processing
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2270 since deposited on 2021-10-20
7last month
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Acq. date: 2026-01-11
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Metrics
Views
2270 since deposited on 2021-10-20
7last month
4last week
Acq. date: 2026-01-11
Citations