Publication:
Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processing
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2263 since deposited on 2021-10-20
11last month
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Acq. date: 2025-12-11
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Views
2263 since deposited on 2021-10-20
11last month
1last week
Acq. date: 2025-12-11
Citations