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Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processing
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Authors
Tinck, Stefan
;
Milenin, Alexey
;
Bogaerts, Annemie
Conference
65th Gaseous Electronics Conference - GEC
Title
Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processing
Publication type
Meeting abstract
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