dc.contributor.author | Tolle, John | |
dc.contributor.author | Weeks, Doran | |
dc.contributor.author | Bauer, Matthias | |
dc.contributor.author | Machkaoutsan, Vladimir | |
dc.contributor.author | Maes, Jan | |
dc.contributor.author | Togo, Mitsuhiro | |
dc.contributor.author | Brus, Stephan | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Loo, Roger | |
dc.date.accessioned | 2021-10-20T17:02:20Z | |
dc.date.available | 2021-10-20T17:02:20Z | |
dc.date.issued | 2012-10 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21622 | |
dc.source | IIOimport | |
dc.title | Orientation dependence of Si1-xCx:P growth and the impact on FiNFET structures | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Machkaoutsan, Vladimir | |
dc.contributor.imecauthor | Maes, Jan | |
dc.contributor.imecauthor | Brus, Stephan | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 491 | |
dc.source.endpage | 497 | |
dc.source.conference | SiGe, Ge, and Related Compunds 5: Materials, Processing, and Devices | |
dc.source.conferencedate | 7/10/2012 | |
dc.source.conferencelocation | Honolulu, HI USA | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 50, Issue 9 | |