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Impact of EUV mask surface roughness on LER

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorYounkin, Todd
dc.contributor.authorLeeson, Michael J.
dc.contributor.authorYan, Pei-Yang
dc.date.accessioned2021-10-20T17:22:10Z
dc.date.available2021-10-20T17:22:10Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21661
dc.sourceIIOimport
dc.titleImpact of EUV mask surface roughness on LER
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83220N
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8322


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