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Thermal and plasma treatments for improved (Sub-)1nm EOT RMG high-k last devices

dc.contributor.authorVeloso, Anabela
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorSimoen, Eddy
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorShi, Xiaoping
dc.contributor.authorCho, Moon Ju
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorChew, Soon Aik
dc.contributor.authorVecchio, Emma
dc.contributor.authorSebaai, Farid
dc.contributor.authorRoussel, Philippe
dc.contributor.authorSantos, S. D.
dc.contributor.authorSchram, Tom
dc.contributor.authorHiguchi, Y.
dc.contributor.authorThean, Aaron
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-20T18:12:57Z
dc.date.available2021-10-20T18:12:57Z
dc.date.issued2012-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21763
dc.sourceIIOimport
dc.titleThermal and plasma treatments for improved (Sub-)1nm EOT RMG high-k last devices
dc.typeMeeting abstract
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.conference43rd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate6/12/2012
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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