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An environment friendly wet strip process for 193 nm lithography patterning in BEOL applications
Publication:
An environment friendly wet strip process for 193 nm lithography patterning in BEOL applications
Date
2012
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vereecke, Guy
;
Kesters, Els
;
Le, Quoc Toan
;
Claes, Martine
;
Lux, Marcel
;
Struyf, Herbert
;
Carleer, Robert
;
Adriaensens, Peter
Journal
Abstract
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2006
since deposited on 2021-10-20
Acq. date: 2025-10-28
Citations
Metrics
Views
2006
since deposited on 2021-10-20
Acq. date: 2025-10-28
Citations