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15nm half-pitch patterning: EUV + SELF-aligned double patterning

dc.contributor.authorVersluijs, Janko
dc.contributor.authorSouriau, Laurent
dc.contributor.authorHellin, David
dc.contributor.authorOrain, Isabelle
dc.contributor.authorKimura, Yoshie
dc.contributor.authorKunnen, Eddy
dc.contributor.authorDekkers, Harold
dc.contributor.authorShi, Xiaoping
dc.contributor.authorAlbert, Johan
dc.contributor.authorWiaux, Vincent
dc.contributor.authorXu, Kaidong
dc.date.accessioned2021-10-20T18:31:45Z
dc.date.available2021-10-20T18:31:45Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21797
dc.sourceIIOimport
dc.title15nm half-pitch patterning: EUV + SELF-aligned double patterning
dc.typeOral presentation
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec


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