Authors

Versluijs, Janko; Truffert, Vincent; Murdoch, Gayle; De Bisschop, Peter; Trivkovic, Darko; Wiaux, Vincent; Kunnen, Eddy; Souriau, Laurent; Demuynck, Steven; Ercken, Monique

Conference

Optical Microlithography XXV

Title

Process development using negative tone development for the dark field critical layers in a 28 nm node process

Publication type

Proceedings paper

Embargo date

9999-12-31