Show simple item record

Process development using negative tone development for the dark field critical layers in a 28 nm node process

dc.contributor.authorVersluijs, Janko
dc.contributor.authorTruffert, Vincent
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorWiaux, Vincent
dc.contributor.authorKunnen, Eddy
dc.contributor.authorSouriau, Laurent
dc.contributor.authorDemuynck, Steven
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-20T18:32:21Z
dc.date.available2021-10-20T18:32:21Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21798
dc.sourceIIOimport
dc.titleProcess development using negative tone development for the dark field critical layers in a 28 nm node process
dc.typeProceedings paper
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorErcken, Monique
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83260W
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8326


Files in this item

Thumbnail
Name:
23670.pdf
Size:
954.7Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record