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Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes

dc.contributor.authorWong, Patrick
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorRobertson, Stewart
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-20T19:04:15Z
dc.date.available2021-10-20T19:04:15Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21860
dc.sourceIIOimport
dc.titleLitho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83260E
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8326


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